EUV Lithography’s Prospects Are Brightening – IEEE Spectrum

After a hard slog, extreme ultraviolet (EUV) lithography seems to be closing in on a long-sought quarry: a light source bright enough to pattern chips cheaply and keep Moore’s Law marching along.

The technology, which uses 13.5-nanometer light instead of today’s 193-nanometer light, could—at least in the short term—allow chipmakers to create finer features without having to expose chips multiple times, a process that can add significantly to the expense of the manufacturing process.

http://spectrum.ieee.org/tech-talk/semiconductors/devices/euv-lithography-is-brightening-up

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