EUV Lithography’s Prospects Are Brightening – IEEE Spectrum
After a hard slog, extreme ultraviolet (EUV) lithography seems to be closing in on a long-sought quarry: a light source bright enough to pattern chips cheaply and keep Moore’s Law marching along. The technology, which uses 13.5-nanometer light instead of today’s 193-nanometer light, could—at least in the short term—allow chipmakers to create finer features without →